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作 者:章春来[1] 祖小涛[1] 蒋晓东[2] 袁晓东[2] 王毕艺[1] 宴良宏[2] 张洪亮[2] 徐世珍[1] 田东斌[1] 尹伟[1] 赵松楠[2] 吕海兵[2]
机构地区:[1]电子科技大学物理电子学院,成都610054 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900
出 处:《强激光与粒子束》2008年第6期956-960,共5页High Power Laser and Particle Beams
基 金:国家高技术发展计划项目;教育部新世纪优秀人才支持计划资助课题(NCET-04-0899)
摘 要:以正硅酸乙酯为前驱体,氨水作催化剂,采用溶胶-凝胶法提拉镀制SiO2双面膜,对薄膜进行氨处理和热处理。采用椭偏仪、分光光度计、红外光谱、扫描探针显微镜、静滴接触角测量仪表征薄膜的特性。研究表明:经氨热两步后处理,膜厚持续减小,折射率经氨处理先增大了0.236,再经热处理又减小了0.202,膜层透光性变好,透过率峰值持续向短波方向移动;经两步后处理的膜面平整度明显变好,与水的接触角先增大到58.92°后减小到38.07°。SiO2 thin films were deposited using tetraethoxylsilane as precursor, ammonia as catalyst on K9 glass by sol-gel method. These films were post-treated by ammonia and heat. The properties of the coatings were characterized by ellipsometer, UV-vis spectrophotometry, FTIR-spectroscopy, scanning probe microscope and contact angle measurement apparatus. The results indicate that the thickness of the films with ammonia and heat treatment tend to decrease. Both the refractive index and water contact angle increase after ammonia treatment. However, they both decrease after heat treatment. The former increases by 0. 236 for the first step, then decreases by 0. 202 for the second. The latter increases to 58.92%, then decreases to 38.07%. The transmittance of the coatings turn to be better and continuously shift to short wave by UV-vis spectrophotometry. The surface becomes smoother by AFM after the two-step treatment.
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