双层结构TiO2-WO3气敏薄膜特性的研究  

Study on Gas Sensing Properties of TiO_2-WO_3 Bi-layer Structure Thin Film

作　　者：尹英哲[1,2] 胡明[1] 冯有才[1] 陈鹏[1] 刘志刚[1] 

机构地区：[1]天津大学电子信息工程学院,天津300072 [2]金策工业综合大学电子工程系,朝鲜平壤

出　　处：《压电与声光》2008年第5期588-590,593,共4页Piezoelectrics & Acoustooptics

基　　金：国家自然科学基金资助项目(60771019)

摘　　要：用直流反应磁控溅射法制备了TiO2—WO3双层结构的气敏薄膜，进行了薄膜微结构和化学成分分析，研究了TiO2表面层对WO3气敏特性的影响。实验证明：当TiO2膜厚为30nm时，WO3薄膜对NO2敏感特性得到改善，TiO2—WO3结构的薄膜对空气中较低浓度的NO2（体积分数为（1～3）×10。）具有优异的敏感特性和响应特性。最适宜的工作温度为120℃，在一些气体（如CO、H2S、C2H5OH、H2）中对NO2的选择性也大大提高。TiO2-WO3 gas sensitive thin films with Bi-layer structure were prepared by dc reactive magnetron sputtering. The microstructure and chemical composition of these films have been characterized and the effects of TiO2 overlayer on WOa gas sensing properties were discussed. Ti added WO3 thin film revealed excellent sensitivity and response characteristics in the presence of low concentration of NO2 （ （1-3）×10^-5 ） gas in air at 120℃ operating temperature. Especially, in case 30 nm thickness of additive Ti, WO3 thin films have a promotional effect on the speed of response and recovery to NH3 and on the selectivity enhanced with respect to other gases （CO, H2S, C2 H3OH, H2）.

关 键 词：直流反应磁控溅射 双层结构 反应速率 气敏 

分 类 号：TP212[自动化与计算机技术—检测技术与自动化装置]