氧气浓度对ZnO薄膜光电性能的影响  

Influence of the Density of Oxygen on Optical and Electrical Properties of ZnO

作　　者：肖慧[1] 徐哈宁[1] 朱昌[2] 吴礽国 

机构地区：[1]东华理工大学核工程技术学院,344000 [2]西安工业大学光电工程学院,710032 [3]宜黄县建筑综合管理站,344000

出　　处：《中国科技信息》2008年第20期38-39,共2页China Science and Technology Information

摘　　要：采用磁控溅射法镀制ZnO薄膜,通过椭偏仪和四探针测试仪分析了氧气浓度对薄膜光电性能的影响。结果表明:随着氧分压的增加,薄膜折射率呈变大的趋势,电阻率升高,导电性能降低。ZnO films have been prepared by magnetron sputtering, influence of the density of oxygen on optical and electrical properties are analyzed by ellipsometer and Four--probe apparatus. The results of measurement indicate that with increasing growth density of oxygen the ZnO film are characterized by high refractive index and high resistivity.

关 键 词：ZNO薄膜 磁控溅射 折射率 电阻率 

分 类 号：TB383.2[一般工业技术—材料科学与工程]