CVD金刚石膜的抛光研究进展  

Progress in Polishing of CVD Diamond Films

作　　者：吴振辉[1] 马志斌[1] 谭必松[1] 张磊[1] 吴利峰[1] 

机构地区：[1]武汉工程大学等离子体化学与新材料省重点实验室,湖北武汉430073

出　　处：《硬质合金》2008年第3期192-197,共6页Cemented Carbides

基　　金：湖北省高等学校优秀中青年科技创新团队计划项目(2004419)

摘　　要：化学气相沉积的金刚石膜表面一般比较粗糙,需要经过抛光才能实现其具体的工业应用。本文介绍了各种抛光CVD金刚石膜的方法及近来研究进展,分析了各种技术的优缺点,并结合工业应用对CVD金刚石膜的抛光前景作了展望。The polishing of CVD diamond has been a necessarily working procedure before its industrial applications due to its rough surfaces. Various polishing techniques of CVD diamond films and research progress in recent yeats are introduced in this paper, and their advantages and disadvantages are also been analyzed. Finally, the future developments of polishing are prospected combining to industrial applications.

关 键 词：CVD 金刚石膜 抛光 

分 类 号：TB383.2[一般工业技术—材料科学与工程]