大面积10000线/毫米软X射线金属型透射光栅的设计、制作与检测  

The design,fabrication and performance of a large area 10000 line/mm metal transmission diffraction gratings for soft X-ray

作　　者：朱伟忠[1] 吴衍青[1] 郭智[1] 朱效立[2] 马杰[2] 谢常青[2] 史沛熊 周洪军[4] 霍同林[4] 邰仁忠[1] 徐洪杰[1] 

机构地区：[1]中科院上海应用物理研究所,上海201800 [2]中国科学院微电子研究所,北京100029 [3]丹麦科技大学,哥本哈根2800 [4]中国科技大学国家同步辐射实验室,合肥230029

出　　处：《物理学报》2008年第10期6386-6392,共7页Acta Physica Sinica

基　　金：国家重点基础研究发展计划(973)项目(批准号:2007CB935302);国家高技术研究发展计划(863)新材料领域(批准号:2006AA03Z355)资助的课题~~

摘　　要：基于严格的矢量耦合波理论,优化设计了用于13.4 nm软X射线干涉光刻的透射型双光栅掩模版.采用电子束光刻技术,在国内首次成功制作了周期为100 nm的大面积金属型透射光栅.光栅面积为1.5 mm×1.5 mm,Cr浮雕厚度为50 nm,Gap/period为0.6,衬底Si3N4厚度为100 nm.此光栅将用于上海光源软X射线干涉光刻实验站.利用其1级衍射光和2级衍射光将可以经济高效地制作周期为50和25 nm的大面积周期结构.最后,测量了该光栅对波长为13.4 nm同步辐射光的衍射光强度,并且推算得出该光栅的1级和2级衍射效率分别为4.41%和0.49%,与理论设计值比较符合.实验结果与理论模拟结果的对比表明该光栅侧壁陡直,Gap/period的控制也与设计值符合.Based on the rigorous coupled-wave analysis, the optimized design for a transmission two-gratings mask for 13.4 nm soft X-ray interference lithography has been accomplished. Then a large area transmission gratings was successfully fabricated by electron beam lithography （EBL）, which has an area of 1.5 mm × 1.5 mm, ruling period of 100 nm, Cr relief thickness of 50 nm, gap/period of O. 6, and Si3 N4 substrate thickness of 100 nm. Based on the quantitative estimation of the measurement data, the first and second order diffraction efficiencies were determined as 4.41% and 0.49%, respectively, in good agreement with the numerical simulation results. Through comparison between the measurement and the numerical simulation results, it was shown that the relief is entirely vertical and the gap/period was well controlled. This two-grating mask will be used installed on the soft X-ray interference lithography endstation at Shanghai Synchrotron Radiation Facility （SSRF）. With its 1st and 2nd order diffraction, 50 nm period and 25 nm period gratings can be cost-effectively fabricated, respectively.

关 键 词：软X射线金属型透射光栅 严格耦合波方法 衍射效率 软X射线干涉光刻 

分 类 号：TP274.5[自动化与计算机技术—检测技术与自动化装置] TN25[自动化与计算机技术—控制科学与工程]