基于SEM纳米级电子束曝光机的快速束闸设计  

The Design of Fast Beam Blanker for Nano E-beam Lithography Based on SEM

作　　者：刘俊标[1] 方光荣[1] 靳鹏云[1] 薛虹[1] 张福安[1] 顾文琪[1] 

机构地区：[1]中国科学院电工研究所,北京100190

出　　处：《电子工业专用设备》2008年第10期10-13,共4页Equipment for Electronic Products Manufacturing

摘　　要：基于扫描电镜(SEM)的纳米级电子束曝光系统能够以较低成本满足科研单位对纳米加工设备的需求。在电子束曝光系统中,需要快速束闸控制电子束通断以实现纳米图像的多场曝光。从安装位置、机械结构和驱动器等方面讨论快速束闸的设计。Nanometer E-beam lithography based on SEM can meet the need of nanofabrication re search and design activities at low price. Fast beam blanker is needed when a nano-pattern with more one writing field in E-beam lithography. This paper presented the design of fast beam blanker from the placing position, structure and its driver with examples.

关 键 词：电子束曝光 束闸 扫描电子显微镜 图形发生器 

分 类 号：TN305.9[电子电信—物理电子学]