高精密运动平台的重复控制  

Repetitive control for high accurate motion platform

作　　者：杜飞[1] 吴运新[1] 

机构地区：[1]中南大学机电工程学院,长沙410083

出　　处：《现代制造工程》2008年第11期13-16,共4页Modern Manufacturing Engineering

基　　金：国家自然科学基金项目(50390064);上海市科委资助项目

摘　　要：为给步进扫描光刻机的设计研究提供理论指导,解决光刻机工作台宏动平台的控制问题,建立了步进扫描光刻机模拟减振试验平台宏动定位系统工作台伺服系统的数学模型,并根据该系统重复运动的特点,提出一种基于重复控制补偿的PID控制方式。运用MATLAB软件进行仿真试验,仿真结果表明与普通PID控制相比,基于重复控制补偿的PID控制器可以有效地减小跟踪误差,因而可以使系统有更好的控制效果。In order to provide academic steering for the design of stepping and scanning lithography and settle the controlling problem of the macro-motion table for lithography wafer stage, establishes the mathematic model of the macro-motion positioning system for lithography wafer stage. Based on the character of the system, uses a PID controller with repetitive control for the position controller of the system. Simulation tests using MATLAB software indicate that compared with common PID controller the PID controller with repetitive control can effectively reduce the tracking error. So the suggested control method has a better control performance than common PID controller.

关 键 词：步进式扫描光刻机 工件台 数学模型 重复控制 

分 类 号：TN305.7[电子电信—物理电子学]