步进投影数字光刻技术研究  

Research on Digital Projection Step Lithography

作　　者：徐文祥[1] 王建[1] 赵立新[1] 严伟[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《中国仪器仪表》2008年第12期48-50,共3页China Instrumentation

摘　　要：随着微纳加工技术的不断发展,其对光刻技术提出了新的要求,步进投影数字光刻技术作为光刻技术的重要分支,在光刻发展的过程中,扮演着不可替代的角色。主要介绍步进投影数字光刻技术的原理及组成,详细阐述关键技术单元,如数字掩模投影成像技术、照明均匀化处理技术、CCD同轴调焦及对准技术等,并利用该技术进行了分辨率测试和灰度图形曝光实验。实验结果表明该技术在微细加工领域达到国内先进水平。With the development of micro- and nano-fabrication technology, more and more challenges of optical lithography become urgent in the semiconductor field. Digital projection step lithography （DPSL）, as a branch of optical lithography, act as an important role in the history of optical lithography. The principle and configuration of DPSL was introduced in this paper, the key technologies, such as mask projection digital imaging technology,uniform illumination technology, CCD focusing technology and alignment technology were explained in detail, The resolution test and gray image exposure experiment by DPSL showed DPSL achieved the top class in domestic micro-fabrication field.

关 键 词：数字掩模 数字光刻 DMD 同轴调焦 

分 类 号：TG665[金属学及工艺—金属切削加工及机床]