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作 者:伍康[1,2] 叶雄英[1,2] 刘力涛[1,2] 陈烽[1,2] 周兆英[1,2]
机构地区:[1]清华大学精密仪器与机械学系,北京100084 [2]清华大学精密测试技术及仪器国家重点实验室,北京100084
出 处:《纳米技术与精密工程》2009年第1期56-59,共4页Nanotechnology and Precision Engineering
基 金:国家自然科学重点基金资助项目(50730009)
摘 要:介绍了一种新型集成光栅干涉微位移测量方法,设计加工了微位移敏感芯片,并进行了初步的性能测试.敏感芯片利用硅-玻璃键合体硅工艺制作而成,在玻璃上制有金属光栅,光栅上方有由铝梁支撑的可动结构.实验系统由敏感芯片、半导体激光器、光电二极管以及相应的驱动、检测电路组成.入射激光照射到光栅上产生衍射光斑,衍射光的光强随可动结构与光栅之间的距离变化,通过测量衍射光强的变化可以得到位移.测试实验结果表明,所制作的集成光栅干涉微位移敏感芯片可实现位移检测,最小可检测的位移约0.2nm.An inteferometric detection method for micro-displacement based on an integrated diffraction grating was introduced. The micro-displacement sensitive chips were designed and fabricated, and primary experiments were carried out to test the performance of the chip. The sensitive chip is a silicon-on-glass structure. Metal stripes on the glass substrate were formed as an optical diffraction grating. A movable structure suspended by aluminium beams was placed above the grating. The experimental setup consisted of the sensitive chip, a laser diode module, a photodiode and driving and detecting circuits. The incident laser beam illuminated the grating and the grating reflected the laser beam to form diffraction pattern. Displacement between the movable structure and the grating changed the intensity of the diffracted beams, which could be detected to get the change of displacement. Experimental results show that the displacement sensitive chip can implement displacement detection, and the minimum detectable displacement is about 0.2 nm.
分 类 号:TH822[机械工程—仪器科学与技术]
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