直接耦合式微波等离子体CVD金刚石膜装置的研究  

Study of Direct Coupled of Microwave Plasma CVD Diamond-films Device

作　　者：杜康[1] 徐伟[1] 吴智量[1] 贺中信[1] 彭军[1] 

机构地区：[1]广州大学物理与电子工程学院,广东广州510006

出　　处：《甘肃联合大学学报（自然科学版）》2009年第1期45-48,共4页Journal of Gansu Lianhe University :Natural Sciences

基　　金：广州市属高校科技计划项目(62003)

摘　　要：利用实验室自行设计了直接耦合式微波等离子体化学气相沉积(Chemical Vapor Deposition,CVD)金刚石膜装置,并在石英管反应腔加上磁镜场来更好的约束等离子体,使等离子体球成为"碟盘"状,使沉积面积大、性能稳定、减少在石英管壁和观察窗的沉积,从而有效的提高电离的活性基团利用率,沉积出高质量的(类)金刚石膜.We design new experiment device, direct Coupled of Microwave Plasma CVD diamona-films Device. We use magnetic mirror in quartz tube reaction chamber lens to better constraint plasma. Plasrna becomes to ＂dish plate＂ sedimentary area, stable performance,that reduces attachments on quartz tube and observing window, effectively using of sedimentary facies of active functional deposit high quality and large area diamond film.

关 键 词：微波等离子体 化学气相沉积 金刚石膜 磁镜场 

分 类 号：TB848[一般工业技术—摄影技术]