原子层沉积技术及其在光学薄膜中的应用  

Atomic Layer Deposition and Its Applications in Optical Thin Films

作　　者：何俊鹏[1] 章岳光[1] 沈伟东[1] 刘旭[1] 顾培夫[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,杭州310027

出　　处：《真空科学与技术学报》2009年第2期173-179,共7页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助项目(No.60778025)

摘　　要：回顾了原子层沉积(ALD)技术的发展背景,通过分析ALD的基本工艺,并与传统薄膜制备工艺进行了对比研究,介绍了它在膜层的均匀性、保形性以及膜厚控制能力等方面的优势。着重列举ALD在减反膜、紫外截止膜、折射率可调的薄膜、抗激光损伤薄膜及复杂结构光子晶体等方面的应用。同时指出了目前ALD工艺在光学薄膜应用中存在的主要问题,并对ALD未来的发展进行了展望。The latest progress of atomic layer deposition （ALD） technology for optical coating was tentatively reviewed. First,the film growth conditions,including deposition rate, pressure and substrate temperature were compared with those of the conventional techniques. Besides, the advantages of the ALD technique, including good uniformity and high stability of the film, and easy control of the film thickness were introduced. Next, the influence of the precursors, especially for oxide films, on microstmctures and optical properties was discussed. Finally, the strengths and weaknesses of the filters made of ALD films, including antireflection coating（AR）, variable refractive index films, laser resistant coatings and ultraviolet （UV） blocking filters were discussed.

关 键 词：原子层沉积 光学薄膜 前驱体 光子晶体 

分 类 号：O484.4[理学—固体物理]