不同工艺条件下Ni／Ti周期性多层膜界面粗糙度的研究  

Research of Interfacial Roughness of Ni/Ti Periodic Multilayer in Different Technology Conditions

作　　者：俞坚钢[1,2] 姜宏伟[1] 郑鹉[1] 朱涛[2] 

机构地区：[1]首都师范大学物理系,北京100048 [2]中国科学院物理研究所北京凝聚态物理国家实验室,北京100190

出　　处：《中国材料科技与设备》2009年第3期54-56,59,共4页Chinese Materials Science Technology & Equipment

摘　　要：本文采用直流磁控溅射法制备了一系列Ni／Ti周期性多层膜，用X射线小角衍射进行周期结构分析。主要研究了不同的制备工艺条件下，Ni／Ti周期性多层膜周期厚度和界面粗糙度的变化规律，从而归纳出最佳的溅射工艺条件。研究发现采用移动模式制备出的多层膜，其周期厚度的均匀性以及界面粗糙度均优于固定模式；并且在移动模式下制备的多层膜其界面粗糙度，随基片架移动速率的增大而减小。In this paper, we use small-angle X-ray diffraction to analyze the periodical structures of a series of Ni/Ti multilayer fabricated by the DC magnetron sputtering. The main idea of this paper is to study the variations of periodical thickness and interracial roughness of the sample multilayer under different technology conditions and further obtain a optimum sputte- ring condition. It is found that both of the evenness of periodical thickness and interracial roughness of the multilayer fabricated by sweeping mode are better than the ones obtained by the stationary mode; moreover, under the sweeping mode, the interracial roughness will decrease as the speed of substrate increasing.

关 键 词：直流磁控溅射 Ni/Ti周期性多层膜 X射线小角衍射 界面粗糙度 

分 类 号：TB302.1[一般工业技术—材料科学与工程]