ZnS上HfON保护膜及增透膜系的制备和性能研究  

Preparation and properties of hafnium oxynitride protective films and anti-reflection films on ZnS substrates

作　　者：刘伟[1] 张树玉[1] 闫兰琴[1] 袁果[1] 刘嘉禾[1] 黎建明[1] 杨海[1] 苏小平[1] 余怀之[1] 

机构地区：[1]北京有色金属研究总院,北京国晶辉红外光学科技有限公司,北京100088

出　　处：《激光与红外》2009年第5期531-533,共3页Laser & Infrared

摘　　要：用氮氧化铪薄膜作为CVDZnS衬底的保护膜、由YbF3和ZnS组成的增透膜系分别在CVDZnS的两面制备了保护膜和增透膜,研究了镀膜前后CVDZnS在8-12μm波段的光学性能,单面镀制增透膜之后CVDZnS在此波段的平均透过率由未镀膜前的74%提高到了82%,峰值透过率大于83.5%。在CVDZnS上镀制HfON保护膜后,其8-12μm波段透过率没有明显的降低,同时硬度测试表明HfON薄膜的硬度约为11.6 GPa,远大于衬底CVDZnS的硬度。胶带实验和泡水试验表明,制备的保护膜和增透膜均和衬底有很好的附着力。Hafnium oxynitride protective films and anti-reflection films were separately prepared onto double side of CVDZnS substrates. The optical properties of CVDZnS before and after coated AR in the region of 8 - 12μ m were studied. After coated AR on the single surface of CVDZnS substrates, the average transmittance improved from 74% to 82% and the peak transmission of the films was more than 83.5%. After coated HfON protective films, the transmittance of HfON/CVDZnS/AR system had no obvious decreased in the region of 8 - 12μm and the hardness of HfON/ CVDZnS system had the value of 11.6GPa which higher than the hardness of CVDZnS substrates. The HfON protective films and anti-reflection films had good adherence with the CVDZnS substrates.

关 键 词：硫化锌 氮氧化铪保护膜 增透膜 硬度 

分 类 号：TN213[电子电信—物理电子学] TB43[一般工业技术]