偏压对磁控溅射纯Cr镀层组织形貌及耐腐蚀性能的影响  

Effect of Bias Voltage on Micromorphology and Corrosion Resistance of Pure Cr Coating Deposited by Magnetron Sputtering

作　　者：李洪涛[1] 蒋百灵[1] 曹政[1] 陈雪[1] 乔泳彭[1] 

机构地区：[1]西安理工大学材料科学与工程学院,陕西西安710048

出　　处：《西安理工大学学报》2009年第2期141-145,共5页Journal of Xi'an University of Technology

基　　金：国家高技术研究发展计划(863计划)资助项目(2005AA33H010)

摘　　要：基于磁控溅射离子镀技术在不同偏压下于单晶硅和45钢基体上制备了纯Cr镀层。采用扫描电子显微镜、X射线衍射仪和CH1660B电化学工作站(极化曲线)分析了纯Cr镀层表面、截面微观形貌和择优生长取向的变化规律,并考察了纯Cr镀层的耐腐蚀性能。结果表明:偏压显著影响着纯Cr镀层的组织结构、择优取向以及耐腐蚀性能。基体偏压值大于90V后纯Cr镀层的组织结构由柱状晶向等轴晶转变纯Cr镀层组织形貌由柱状晶逐渐向等轴晶转变,随着偏压值增大,纯Cr镀层晶体择优生长面由(200)晶面变为(110)晶面,镀层耐腐蚀性能逐渐增强;且偏压值为120V时,镀层耐腐蚀性能表现最优;纯Cr镀层中晶体颗粒尺寸的减小和致密度的增加是耐腐蚀性提高的主要原因。Pure Cr coatings was deposited by magnetron sputtering ion plating on single crystal silicon and 45 steel substrates under different bias voltage. The micromorphology, crystal preferential orientation and corrosion resistance performance of pure Cr coatings were analyzed by SEM, XRD and electrochemistry polarization curve respectively. The result showed that the morphology, preferential orientation, and corrosion resistance performance of coatings were influenced by bias voltage significantly. Micromorphology of the pure Cr coating changed from columnar crystals to isometric crystal above 90V of bias voltage. With an increasing in bias voltage, the preferential orientation growth plane of pure Cr coating transferred from the （200） crystal plane to （110） crystal plane. Corrosion resistance performance of coatings increased with increasing bias voltage, and showed the best performance at the bias voltage of 120V. The main cause of corrosion resistance performance can attribute to the improvement of fine grain size and dense coating structure.

关 键 词：偏压 磁控溅射 纯Cr镀层 组织形貌 耐腐蚀性能 

分 类 号：TG174.2[金属学及工艺—金属表面处理]