闭合状态对磁控溅射Cr镀层生长过程的影响  

Influence of Closed-state on Growth of Cr Coating by Magnetron Sputtering

作　　者：栾亚[1] 丁小柯[1] 蒋百灵[1] 鲁媛媛[1] 

机构地区：[1]西安理工大学材料科学与工程学院,西安710048

出　　处：《人工晶体学报》2009年第4期924-929,共6页Journal of Synthetic Crystals

基　　金：国家高技术研究发展计划(863计划)(No.2005AA33H010)

摘　　要：利用非平衡磁控溅射离子镀技术于不同磁场闭合状态下在单晶硅基体上制备出Cr膜,采用扫描电子显微镜和X射线衍射仪观察并分析了不同闭合状态下镀层的微观形貌和晶体择优生长趋势。结果表明:闭合状态显著影响着Cr膜生长过程中的柱状晶取向和致密度。不闭合状态下,Cr膜截面组织为典型疏松的柱状晶体组织,镀层沿(110)面择优生长;半闭合状态下,Cr膜截面组织为较致密的柱状晶体组织,在不同生长时期,镀层沿(110)或(200)面择优生长;完全闭合状态下,Cr膜截面组织在初始1μm范围内,为致密纤维状晶体组织,随后呈现致密的无明显柱状晶体形貌,镀层沿(200)面择优生长。Cr coatings were deposited on the surface of Si substrates at different closed-state of magnetic field using unbalanced sputtering ion plating system. The SEM, XRD were used respectively to analyze the influence of closed-state of magnertic field on microstructure and preferred orientation of Cr coatings. The results show that the changes of closed-state of magnertic field significantly affected on crystal orientation and tightness of Cr coatings. Loose columnar grains are obtained at unclosed state and the preferred orientation of Cr coatings is Cr （110） ; compact columnar grains are obtained at semi-closed state and the preferred orientation was C r（110） or Cr（200） at differrent growing periods;while unvisible compacter columnar grains were obtained at closed state and the preferred orientation were Cr（200）.

关 键 词：闭合状态 磁控溅射 择优取向 

分 类 号：TG174.44[金属学及工艺—金属表面处理]