无掩模腐蚀下的凸角削角及补偿研究  

A Study on the Principles and the Compensation for Maskless-etched Convex-corner Undercutting

作　　者：李昕欣[1,2] 杨恒[1,2] 沈绍群[1,2] 鲍敏杭 

机构地区：[1]复旦大学电子工程系传感器研究室,上海200433 [2]中科院传感技术国家实验室,上海200050

出　　处：《传感技术学报》1998年第3期1-6,共6页Chinese Journal of Sensors and Actuators

基　　金：国家自然科学基金;中科院传感技术国家重点实验室;"九五"科技攻关等项目的资助

摘　　要：在使用无掩模腐蚀制作硅微机械结构时,其结构凸角的削角特性有别于常规有掩模腐蚀时的情况.本文通过分析和实验,研究了该情况下凸角削角尺寸的变化规律和特点,并给出了对其进行补偿的原则和方法.Thc Charactristics of maskless-etched convex-corner undercutting is differentfrom that formed by conventional masked etching. In this paper the principles of the mask-less-etched undercutting are investigated by using both analyses and experiments. Theregularities and the practical methods of the compensation for the maskless-etched under-cutting are provided.

关 键 词：硅 各向异性腐蚀 削角补偿 微机械结构 

分 类 号：TN304.12[电子电信—物理电子学] TN305.2