快速退火对Pt/BST/Pt电容器结构和性能的影响  

Effect of rapid thermal annealing on the structure and physical properties of Pt/BST/Pt capacitors

作　　者：王玉强[1,2] 刘保亭[1] 孙杰[2] 郭哲[1] 范志东[2] 彭英才[2] 

机构地区：[1]河北大学物理科学与技术学院,河北保定071002 [2]河北大学电子信息工程学院,河北保定071002

出　　处：《电子元件与材料》2009年第12期39-42,共4页Electronic Components And Materials

基　　金：国家自然科学基金资助项目(No.60876055);河北省自然科学基金资助项目(No.E2008000620;E2009000207);教育部科学技术研究重点资助项目(No.207013);河北省应用基础研究计划重点基础研究资助项目(No.08965124D)

摘　　要：采用脉冲激光沉积(PLD)法在Pt/Ti/SiO2/Si(001)基片上制备了Ba0.6Sr0.4TiO3(BST)薄膜,对Pt/BST/Pt电容器在空气中进行400℃快速退火(RTA)处理,研究了快速退火对Pt/BST/Pt电容器的结构和性能的影响。结果表明:快速退火虽然对BST薄膜的结晶质量影响较小,但却极大改善了Pt/BST/Pt电容器的电学性能。当测试频率为100kHz、直流偏压为0V时,介电损耗从快速退火前的0.07减小到0.03,介电常数和调谐率略有增加。快速退火后负向漏电流过大现象得到了明显抑制,正负向漏电流趋于对称,在300×103V/cm电场强度下,漏电流密度为4.83×10–5A/cm2。Ba0.6Sr0.4TiO3（BST） thin film was fabricated on Pt/Ti/SiO2/Si（001） substrate by the pulsed laser deposition （PLD） method. The Pt/BST/Pt capacitors were treated by rapid thermal annealing （RTA） in air at 400℃. Effects of RTA on the structure and physical properties of the Pt/BST/Pt capacitors were investigated. The results show that the microstructure of BST thin film does not change obviously after annealing, but the electrical properties of the BST capacitors are enhanced greatly. The dielectric loss of the BST capacitors, measured at 100 kHz and zero-bias voltage, is reduced from 0.07 to 0.03 after RTA, and the permittivity and tunability are also slightly increased after RTA. The negative leakage current of the BST capacitors is significantly lowered after RTA. The symmetric current characteristics at positive and negative bias voltage are obtained, and the leakage current density is 4.83×10^-5A/cm^2 at 300×10^3 V/cm.

关 键 词：BST薄膜 快速退火 Pt/BST界面层 氧空位 脉冲激光沉积 

分 类 号：TM22[一般工业技术—材料科学与工程]