不同本底真空度下SiC/Mg极紫外多层膜的制备和测试  

Manufacture and measurement of SiC/Mg EUV multilayer mirrors in different base pressures

作　　者：朱京涛[1] 黄秋实[1] 白亮[1] 蒋晖[1] 徐敬[1] 王晓强[1] 周洪军[2] 霍同林[2] 王占山[1] 陈玲燕[1] 

机构地区：[1]同济大学物理系精密光学工程技术研究所,上海200092 [2]中国科技大学国家同步辐射实验室,安徽合肥230029

出　　处：《光学精密工程》2009年第12期2946-2951,共6页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.10435050;No.10675092);国家863高技术研究发展计划资助项目(No.2006AA12Z139);上海市科学技术委员会资助项目(No.07DZ22302);上海市教育发展基金会晨光计划资助项目(No.2008CG25);同济大学青年优秀人才计划资助项目

摘　　要：为研究不同本底真空度对SiC/Mg极紫外多层膜光学性能的影响,利用直流磁控溅射方法在不同本底真空度条件下制备了峰值反射波长在30.4nm的SiC/Mg周期膜。X射线掠入射反射测试结果表明,不同本底真空度条件下制备的SiC/Mg周期多层膜膜层质量有明显差异。用同步辐射测试了SiC/Mg多层膜在工作波长处的反射率,结果表明,本底真空度为6.0×10-5Pa时,SiC/Mg周期膜反射率为43%,而本底真空度在5.0×10-4Pa时,SiC/Mg多层膜反射率仅为30%。同步辐射反射曲线拟合结果表明,反射率随着本底真空度降低是由多层膜Mg膜层中的Mg氧化物含量增多造成的。To improve the optical performance of an EUV muhilayer mirror working at a 30.4 nm wavelength, a series of SiC/Mg muhilayer mirrors with peak wavelenth of 30.4 nm were fabricated with DC magnetron sputtering at different base pressures. The measured results of X-ray diffraction （XRD） show that the muhilayers have obviously different optical properties at different hase pressures. Furthermore,the reflectivities of these muhitayer mirrors were measured by a synchrotron radi ation light,the results indicate that the reflectivity of the muhilayer prepared at the base pressure of 6. 0×10^-1 Pa is as high as 43%, but the reflectivity prepared at the base pressure of 5. 0×10^-4 Paisonly 30%. By analyzing the reflectance curve and scattering curve measured in the synchrotron radiation, it is proved that the decrease of reflectivity of SiC/Mg muhilayer is relative to the content of magnesium oxide in the layers.

关 键 词：极紫外光学 本底真空度 多层膜 反射率 磁控溅射 

分 类 号：O484.1[理学—固体物理]