光刻机精密运动平台的几何及运动误差建模  

Geometric and motion error model of wafer stepper precision motion stages

作　　者：赵强[1,2] 阎绍潭[1] 

机构地区：[1]清华大学精密仪器与机械学系,摩擦学国家重点实验室智能与生物机械分室,北京100084 [2]东北林业大学交通学院,哈尔滨150040

出　　处：《清华大学学报（自然科学版）》2010年第2期241-245,共5页Journal of Tsinghua University(Science and Technology)

基　　金：国家自然科学基金项目(50390062);黑龙江省自然科学基金项目(E200605)

摘　　要：为了提高光刻机硅片台和掩模台的运动精度,建立光刻机精密运动平台的几何及运动误差模型。引入低序体阵列描述光刻机的拓扑结构,采用齐次坐标变换表达多体系统中典型体的几何和运动误差,应用多体系统运动学建立了系统的结构和运动关系以及相应的定位误差方程。进一步分析了光刻机的运动误差链,推导了光刻机运动通用误差模型。以某光刻机精密工作台为例进行误差建模与分析,该方法和结果可为光刻机精度设计提供参考。The precision of wafer stage and mask stage motion is improved by a geometric and motion error model of the wafer stepper motion stages. A lower numbered body array is introduced to describe the wafer stepper topology with a homogeneous coordinate transformation used to model the geometric and motion errors of a typical body in the multi-body system. Multi-body kinematics are employed to derive the structural and motion relations and the corresponding location error equation. The motion error chain for the wafer stepper is analyzed to develop a versatile error model. An entire wafer stepper is analyzed as an example to determine its errors. The method provides a reference for wafer stepper precision design.

关 键 词：光刻机 误差模型 多体运动学 低序体阵列 齐次坐标变换 

分 类 号：TH161.2[机械工程—机械制造及自动化]