原子层沉积制备Al_2O_3薄膜的光学性能研究  

Optical Properties of Al_2O_3 Thin Film Fabricated by Atomic Layer Deposition

作　　者：何俊鹏[1] 章岳光[1] 沈伟东[1] 刘旭[1] 顾培夫[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,浙江杭州310027

出　　处：《光学学报》2010年第1期277-282,共6页Acta Optica Sinica

基　　金：国家自然科学基金(60778025);中国博士后科学基金(20081463)资助课题

摘　　要：研究了原子层沉积制备氧化铝薄膜的光学性能。以三甲基铝(TMA)和水为前聚体,分别在基板温度为250℃和300℃的K9和石英玻璃衬底上沉积了Al2O3光学薄膜。采用分光光度计,X射线光电子能谱(XPS),X射线衍射(XRD),原子力显微镜(AFM),扫描电子显微镜(SEM)等分析手段对薄膜的微结构、表面形貌和光学特性进行了研究。结果表明,原子层沉积法制备的Al2O3薄膜在退火前后均呈现无定形结构,元素成分接近化学计量比,其表面粗糙度小于1.2nm,聚集密度高于0.97,光学非均匀性优于1%。同时在中紫外到近红外均有很好的光学性能,适合作为中间折射率和低折射率材料在光学薄膜中得到应用。The optical properties of Al2O3 films grown by atomic layer deposition were investigated.Trimethylaluminium（TMA） and water vapour（H2O） were used as the chemical precursors to deposit Al2O3 films on glass substrates at temperature of 250 ℃ and 300 ℃ respectively.Characterization of the films such as optical properties,surface morphological image and microstructure were performed by using spectrophotometer,X-ray diffraction（XRD）,X-ray photoelectron spectroscopy（XPS）,scanning electron microscope（SEM） and atomic force microscopy（AFM）.The results show that both the as-deposited and annealed A12O3 films are amorphous.The surface roughness is as low as 1.2 nm while the packing densities are larger than 0.97.Al2O3 films by this technique exhibit good optical properties with low absorption in the spectral region from mid-ultraviolet to near-infrared.This study indicates that Al2O3 film deposited by ALD is applicable for optical coatings of the materials with midde and low refractive index.

关 键 词：薄膜光学 原子层淀积 A12O3薄膜 光学特性 

分 类 号：O484.4[理学—固体物理]