退火对Y_2O_3薄膜结构和光学性能的影响  

Effect of Annealing on Structure and Optical Properties of Y_2O_3 Thin Films

作　　者：王耀华[1,2] 陈广超[2] 贺琦[2] 李成明[2] 吕反修[2] 

机构地区：[1]北京航空材料研究院,北京100095 [2]北京科技大学材料科学与工程学院,北京100083

出　　处：《材料工程》2010年第2期47-51,共5页Journal of Materials Engineering

摘　　要：采用脉冲式静电辅助的气溶胶化学气相沉积方法成功的在Si(100)衬底上制备了Y2O3薄膜,研究了退火对Y2O3沉积薄膜的形貌、结构和光学性质的影响。X射线衍射分析结果表明沉积得到的Y2O3薄膜在退火前为非晶态结构,退火之后薄膜具有立方结构,并且具有(111)择优取向。SEM分析显示薄膜在退火后更加平滑、致密。椭偏仪的测试结果表明薄膜退火后的折射系数提高,消光系数减少。Thin films of Y2O3 were successfully deposited onto Si （100） substrate by pulse electrostatic spray assisted vapor deposition method. The morphology, structure and optical properties of Y2O3 films were studied. The results of XRD analysis indicated that Y2O3 thin films were cubic with （111） oriented growth after annealing, whilst the Y2O3 thin films were amorphous before annealing. The results of FE-SEM analysis showed that Y2O3 thin films after annealing were dense and smooth. The refractive index of thin films was raised and extinction coefficient of the Y2O3 films was decreased after annealing.

关 键 词：ESAVD 氧化钇薄膜 折射系数 

分 类 号：TB43[一般工业技术]