MOCVD生长温度对氧化锌薄膜结构及发光性能的影响(英文)  

Effect of Growth Temperature on the Structural and Optical Properties of ZnO Films Grown by MOCVD

作　　者：王振华[1] 杨安丽[1] 刘祥林[1] 魏鸿源[1] 焦春美[1] 朱勤生[1] 杨少延[1] 王占国[1] 

机构地区：[1]中国科学院半导体研究所半导体超晶格国家重点实验室,北京100083

出　　处：《人工晶体学报》2010年第1期34-38,43,共6页Journal of Synthetic Crystals

基　　金：Project supported by the National Natural Science Foundation of China(No.60506002,60776015);the Special Funds for MajorState Basic Research Project (973) of China(No.2006CB604907);the 863 High Technology R &D Program of China(No.2007AA03Z402,2007AA03Z451)

摘　　要：利用甲醇做氧源,采用金属有机物化学气相沉积(MOCVD)工艺在硅(111)衬底上生长了一系列的氧化锌薄膜,生长温度为400～600℃。薄膜的表面形貌及晶体质量分别利用场发射扫描电镜及X射线衍射仪进行了测量。研究表明:随着生长温度的降低,在X射线衍射图谱中氧化锌(101)峰取代了(002)峰成为了主峰。这可能是由于温度过低使得甲醇未完全分解,而甲醇分子抑制了氧化锌沿c轴极性过快的生长所致。室温光致发光光谱结果表明在较高生长温度下获得的样品具有良好的光学性质,发光强度随着温度的降低而降低。ZnO films were grown on Si （111） substrates by metal organic chemical vapor deposition （MOCVD） method using methanol as oxygen source at 400 to 600 ℃.The morphologies and the crystal quality were characterized by field-emission scanning electron microscopy and X-ray diffraction.SEM results showed that lower temperature was beneficial for two-dimension growth.With the temperature decreases,the （101） diffraction peak becomes the dominant peak instead of diffraction （002）.This result is different from those grown using other oxidant since in most previous work on ZnO growth,ZnO has an intensec-orientation.It is suggested that the incomplete decomposition of methanol at lower temperature restrains the growth along c-axis.Room temperature photoluminescence spectroscopy results show that the samples have near-band edge emissions at higher growth temperature.And the emission intensity of them decreased as the temperature decreasing.

关 键 词：ZNO 甲醇 MOCVD 生长温度 

分 类 号：O484[理学—固体物理]