直流电弧等离子体CVD金刚石膜中氢杂质研究  

Study on Hydrogen Impurity in Diamond Films Deposited by DC Arc Plasma Jet CVD

作　　者：郭世斌[1] 姜春生[1] 吕反修[1] 唐伟忠[1] 李成明[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《人工晶体学报》2010年第1期48-51,56,共5页Journal of Synthetic Crystals

基　　金：国家自然科学基金(No.50572007);博士点基金资助项目(20040008018)

摘　　要：运用傅里叶红外光谱(FT-IR)和核反应分析(NRA)对直流电弧等离子体制备的金刚石膜中的氢杂质进行了研究,并通过添加少量空气到反应气体的实验分析了氢杂质的变化。研究结果发现:红外光谱只能检测金刚石膜中的成键氢,其含量随着氮渗入量的增加而增加,并得出2820cm-1处的吸收是由氮结合的CH基团振动引起的,2832cm-1处的吸收可能是由金刚石膜特征结构缺陷结合的CH基团振动引起的,而不是氧相关的基团。核反应分析可以检测金刚石膜中的总氢含量,近表面小于50nm层氢含量变化快,大于50nm之后氢含量趋于稳定,此值认为是金刚石膜中的总氢含量。The hydrogen impurities in diamond films deposited by DC arc plasma jet CVD were studied by FT-IR spectra and NRA （nucleation reaction analysis）.The variation of hydrogen impurities were studied through the experiments of the air adding to the reaction gas with small amount.The results show that the bonded hydrogen measured by FT-IR spectra and the content of that increase with the nitrogen incorporation content.The absorbance at 2820 cm-1 is yielded by the vibration of the CH group bonding nitrogen.The absorbance at 2832 cm-1 is generated possibly by the vibration of the CH group bonding characteristic structure defects of diamond films,but not generated by the oxygen-related group.The NRA can test the total hydrogen contents in diamond films.The layer（50 nm） near the surface has a fast variety of the hydrogen content.But above 50 nm layer,in the bulk of diamond film,the content becomes stable,which has been considered as the total hydrogen content in diamond films.

关 键 词：CVD 金刚石膜 氢杂质 FT—IR 核反应分析 

分 类 号：O775[理学—晶体学]