双靶反应磁控溅射共沉积AlN薄膜粘结性能研究  

Study on the Adhesion of AlN Thin Films Co-deposited by Dual Targets Reactive Magnetron Sputtering

作　　者：朱家俊[1] 周灵平[1] 刘新胜[1] 彭坤[1] 李德意[1] 李绍禄[1] 

机构地区：[1]湖南大学材料科学与工程学院,长沙410082

出　　处：《人工晶体学报》2010年第1期77-81,共5页Journal of Synthetic Crystals

摘　　要：采用单、双靶反应磁控溅射法分别在45钢、GCr15钢、硅(100)和钼衬底上制备了AlN薄膜。X射线衍射和电子显微分析表明,双靶反应磁控溅射沉积的AlN薄膜具有高致密度和低残余应力,同时采用划痕法和压痕法等对AlN薄膜的粘结强度进行测试,结果表明:双靶反应磁控溅射共沉积AlN薄膜的粘结强度明显比单靶沉积的薄膜高,划痕临界载荷提高0.5～2倍。不同衬底上沉积的AlN薄膜粘结强度存在很大的差别,以钼衬底上沉积的薄膜粘结强度最高,划痕法测得的临界载荷高达64N;GCr15衬底上AlN薄膜摩擦试验表明,AlN薄膜能明显起到减磨作用。AlN films were respectively deposited on 45 steel、GCr15 steel、Si （100） and Mo substrates by single target and dual targets reactive magnetron sputtering.These films were characterized and analyzed by X-ray diffraction （XRD） and scanning electron microscopy （SEM）.It was found that the AlN films with lower residual stress and higher density could be achieved via dual targets reactive magnetron sputtering deposition method.The adhesion of AlN films was measured by scratch test and indentation test.The results revealed that the adhesion of AlN films deposited by dual target reactive magnetron sputtering is obviously higher than that deposited by single target,and the scratch critical load is 0.5-2 times higher than that by single target.It＇ s greatly different of the adhesion of AlN films deposited from different substrates.The adhesion of AlN films deposited on Mo substrate is much higher than others,and the scratch critical load has been risen up to 64 N.Furthermore,the friction and wear test on GCr15 steel substrate showed that the AlN films play an important role in reducing the friction.

关 键 词：ALN薄膜 反应磁控溅射 粘结强度 共沉积 

分 类 号：TB321[一般工业技术—材料科学与工程]