2000lp/mm X射线透射变栅距光栅的研究  

Study on Properties of 2000 lp/mm X-Ray Transmission Varied Line-Space Gratings

作　　者：靳飞飞[1,2] 朱效立[1] 李海亮[1,2] 马杰[1] 谢常青[1] 刘世炳[2] 

机构地区：[1]中国科学院微电子研究所纳米加工与新器件集成技术重点实验室,北京100029 [2]北京工业大学激光工程研究院,北京100022

出　　处：《光学学报》2010年第6期1857-1860,共4页Acta Optica Sinica

基　　金：国家973计划(2007CB935302);国家重大专项(2008ZX02051-005)资助课题

摘　　要：针对X射线透射光栅摄谱仪中对高线密度聚焦变栅距光栅的需要,利用电子束光刻技术,研制了X射线透射变栅距光栅。利用变栅距光栅的自动生成宏文件程序,优化设计了变栅距光栅的版图,然后利用电子束光刻和微电镀技术在聚酰亚胺薄膜底衬上制备了X射线透射变栅距光栅。制作出中心线数为2000lp/mmX射线透射变栅距光栅,栅距变化符合设计要求。衍射效率标定的结果表明,制备的变栅距光栅在中心波长处聚焦作用明显,可以大幅提高衍射光强度和光栅的分辨本领,具有重要的应用价值。The manufacture of high-line-density X-ray transmission self-focusing varied line-space（VLS）gratings for X-ray spectroscopy by using electron beam lithography is reported.Firstly,the VLS gratings are automatically optimized and generated by the macro program.Then using the electron beam lithography and micro-electroplating technology,the VLS gratings are fabricated on polyimide membrane substrate.The 2000 lp/mm X-ray transmission VLS gratings are successfully obtained.It can be seen that the line space of the gratings are all desired.The calibration results of diffraction efficiency of the VLS gratings indicate that the VLS gratings have promising abilities to significantly improve the diffraction intensity and spectrum resolution in the central wavelength.

关 键 词：衍射光学 变栅距光栅 X射线透射光栅 电子束光刻 

分 类 号：TN405[电子电信—微电子学与固体电子学]