磁控溅射方法制备直径120mm高均匀性Mo/Si多层膜  

Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering

作　　者：潘磊[1] 王晓强[1] 张众[1] 朱京涛[1] 王占山[1] 李乙洲 李宏杰 王道荣 赵巨岩 陆伟 

机构地区：[1]同济大学物理系精密光学工程技术研究所,上海市特殊人工微结构材料与技术重点实验室,上海200092 [2]中国运载火箭研究院试验物理与计算数学实验室,北京100076

出　　处：《强激光与粒子束》2010年第7期1535-1538,共4页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(10825521,10876023,10905042);国家高技术发展计划项目;上海市自然科学基金项目(09ZR1434300);上海市科委纳米计划项目(0952nm06900);上海市教育发展基金会晨光计划项目(2008CG25);同济大学青年优秀人才培养计划项目

摘　　要：为满足极紫外、软X射线和X射线大口径多层膜反射镜的需求,采用基板扫掠过矩形靶材表面的镀膜方法,在直径120 mm的平面基板上镀制了Mo/Si周期多层膜。通过调整基板扫掠过矩形靶材表面的速率修正了薄膜的沉积速率,极大地提高了薄膜厚度的均匀性。采用X射线衍射仪对反射镜不同位置多层膜周期厚度进行了测量,结果表明,在直径120 mm范围内,Mo/Si多层膜周期厚度的均匀性达到了0.26%。同步辐射测量多层膜样品不同位置处的反射率,结果表明,在直径120 mm范围内,多层膜的膜层厚度均匀,在入射角10°时13.75 nm波长处平均反射率为66.82%。In order to prepare large size multilayer mirrors for extreme ultraviolet, soft X-ray and X ray applications, the Mo/Si multilayer was deposited on flat substrate in diameter of 120 mm with the substrate scanning over rectangular targets. By adjusting the speed of substrate scanning over sputtering targets, the depositing rate can be controlled, and the uniformity of layer thickness is improved significantly. After deposition, period thicknesses of multilayer on different positions of the mirror were measured by an X-ray diffractometer. The measured results show that, within the diameter of 120 mm, the uniformity of period thickness is within 0.26%. The reflectivities on different positions of the multilayer mirror were measured at the National Syn- chrotron Radiation Laboratory. The results indicate that the multilayer is uniform in thickness, and the mean reflectivity is 66. 82% at wavelength of 13.75 nm and incident angle of 10°.

关 键 词：MO/SI多层膜 磁控溅射 均匀性 反射率 同步辐射 

分 类 号：O434[机械工程—光学工程]