衬底及压强对磁控溅射ZnO薄膜表面形貌的影响  

Substrate and the sputtering pressure on the surface morphology of ZnO thin films

作　　者：霍庆松[1] 张宁玉[1] 付刚[1] 李爽[1] 刘小村[1] 韩利新[1] 张玉华[1] 

机构地区：[1]山东建筑大学理学院,山东济南250101

出　　处：《山东建筑大学学报》2010年第4期382-385,共4页Journal of Shandong Jianzhu University

基　　金：山东省自然科学基金项目(ZR2009FM031);山东建筑大学博士基金项目(XNBS0921)

摘　　要：在压强为0.5Pa和0.7Pa的情况下,采用磁控溅射法分别在Si及石英玻璃衬底上生长ZnO薄膜。利用原子力显微镜对ZnO薄膜的表面形貌进行观察,研究了压强及衬底对薄膜表面形貌的影响。研究表明:在Si衬底上生长的ZnO薄膜,压强为0.7Pa时比压强为0.5Pa时表面粗糙度要大;在相同溅射气压(0.7Pa)下,Si衬底上得到的ZnO薄膜质量明显优于石英玻璃衬底上的。ZnO thin films are deposited on silicon and quartz glass substrates by using the reactive radio-frequency magnetron sputtering method under different deposition pressure（0.5Pa or 0.7Pa）.The influences of pressure and substrates on the surface morphology are studied by atomic force microscopy.The experimental results indicate that the crystalline quality of ZnO thin film is improved with increasing the deposition pressure.And the quality of ZnO film on silicon substrate is superior to that on the quartz glass substrate under the same sputtering pressure（0.7Pa）.

关 键 词：ZNO薄膜 磁控溅射 原子力显微镜 表面形貌 

分 类 号：O484.1[理学—固体物理]