射频反应磁控溅射法制备的氟化类金刚石薄膜摩擦特性研究  

Frictional properties of fluorinated diamond-like carbon films prepared by radio frequency reactive magnetron sputtering

作　　者：王培君[1] 江美福[1] 杜记龙[1] 戴永丰[1] 

机构地区：[1]苏州大学物理系,苏州215006

出　　处：《物理学报》2010年第12期8920-8926,共7页Acta Physica Sinica

摘　　要：以高纯石墨做靶,CHF3和Ar气为源气体,采用射频反应磁控溅射法在不同流量比条件下制备了氟化类金刚石(F-DLC)薄膜.利用原子力显微镜、纳米压痕仪、拉曼光谱和红外光谱、摩擦磨损测试仪对薄膜的表面形貌、硬度、键结构以及摩擦性能做了具体分析.表面形貌测试结果表明,制备的薄膜整体均匀致密,表现出了良好的减摩性能.当CHF3与Ar气流量比r为1:6时,所得薄膜的摩擦系数减小至0.42,而纳米压痕结果显示,此时薄膜的硬度也最高.拉曼和红外光谱显示,随着r的增加,薄膜中的F浓度呈上升趋势,薄膜中的芳香环比例减小.研究表明,F原子的键入方式是影响F-DLC薄膜摩擦系数的一个重要因素,CF2反对称伸缩振动强度的减弱和CC中适量碳氢氟键的形成都能导致薄膜具有相对较低的摩擦系数.The fluorinated diamond-like carbon（F-DLC） films are prepared by radio frequency reactive magnetron sputtering with different flow ratios of CHF3 and Ar as a source gas and pure graphite as a target.Surface morphology,hardness,bonding configuration and tribological properties are investigated by atomic force microscope,nanoindenter,Raman spectra,Fourier transform infrared（FTIR） spectra and a ball-on-disk test rig,respectively.The results show that the F-DLC films are distributed compactly and homogeneously and exhibit good friction-reducing behaviors.The minimum of friction coefficient reaches about 0.42 at r = 1：6 while the hardness of films is highest.Raman spectra and FTIR spectra reveal that with the increase of r,the fluorine content gradually increases.However,the intensity ratio ID /IG of Raman bands of disordered graphite（D-band） and graphite（G-band） of F-DLC films decreases,which is indicative of the decrease of the fraction of aromatic ring.The results also show that the F content is another significant factor which affects the friction coefficient.The weakening of —CF2 asymmetric stretch vibration intensity and t he formation of CFH in C C chains may result in a lower friction coefficient of F-DLC films.

关 键 词：摩擦性能 射频反应磁控溅射 氟化类金刚石薄膜 

分 类 号：O484.2[理学—固体物理]