采用PLC级差法闭环控制中频电源反应溅射沉积Al_2O_3薄膜  

Deposition of Al_2O_3 films by MF reactive magnetron sputtering with graded PLC closed-loop control of target voltage

作　　者：池华敬[1] 王双[1] 周旭[1] 张寿彬 陈革[1] 章其初[1] 

机构地区：[1]皇明太阳能股份有限公司镀膜研究所,山东德州253000

出　　处：《真空》2011年第2期10-14,共5页Vacuum

摘　　要：本工作开发了一种靶电压反馈自动控制系统,称为可编程控制器(PLC)级差法反馈控制系统,用于旋转圆柱金属Al靶真空反应溅射沉积Al2O3陶瓷薄膜。根据反应溅射Al2O3工艺特性设计反馈控制的数学模型,再按照数学模型,采用梯形语言在PLC内进行程序编码实现。通过反馈控制参数的优化,实现较高功率26 kW下中频磁控反应溅射Al2O3工艺稳定。测试得到50 nm厚的Al2O3薄膜,其可见光吸收比和太阳光吸收比接近零。这种反应溅射反馈控制系统简易可行且经济实用。A graded PLC closed-loop feedback control system was developed for target voltage and the system has successfully been applied to the deposition of Al2O3 ceramic films by MF reactive magnetron sputtering with rotating cylindrical metallic Al target.A mathematical model of feedback control was developed according to the characteristics of the reactive magnetron sputtering process for Al2O3 films.Then,the feedback control involved in the model was implemented through the trapezoidel language which was applied to the program encoding in PLC and,with the feedback control parameters optimized,the MF reactive magnetron sputtering process for Al2O3 films under the higher power 26kW became stable.In this way the thickness of Al2O3 films measured is 50nm,with the absorptance of either visible light or sunlight approximates to zero.The feedback control system has been proved easy to operate,economic and practicable.

关 键 词：PLC级差法 反应溅射反馈控制系统 反应溅射 迟滞曲线 AL2O3薄膜 

分 类 号：TB7[一般工业技术—真空技术]