聚苯胺薄膜的制备及其C—V特性研究  

A Study of Polyaniline Thin Film Preparation and C-V Characteristic Measurements

作　　者：戴国瑞[1] 王晓薇[1] 马哲 南金[1] 王宗昌[1] 

机构地区：[1]吉林大学电子工程系,吉林长春130023

出　　处：《功能材料》1999年第5期543-544,556,共3页Journal of Functional Materials

摘　　要：报导了采用PECVD技术制备聚苯胺薄膜及沉积条件对薄膜沉积速率的影响，红外吸收光谱和电容－电压法表征了薄膜的组成及介电特性。Polyaniline thin film were prepared by means of plasma enhanced CVD technique using aniline monomer as a precursor. The deposition conditions effected on deposition rate of the thin films were investigated. The composition and dielectric property were charac-terized by the infrared spectroscopy and C - V measuring method.

关 键 词：PECVD 聚苯胺 薄膜 C-V特性 制备 

分 类 号：O633.21[理学—高分子化学]