磁场闭合状态对磁控溅射Cr镀层沉积效果的影响差异分析  

Effect of Magnetic Field State on Magnetron Sputtered Cr Coatings

作　　者：蒋百灵[1] 曹政[1] 丁小柯[1] 鲁媛媛[1] 

机构地区：[1]西安理工大学材料科学与工程学院,陕西西安710048

出　　处：《材料科学与工程学报》2011年第1期25-29,共5页Journal of Materials Science and Engineering

基　　金：国家高技术研究发展计划(863计划)项目基金资助项目(2005AA33H010)

摘　　要：采用磁场完全闭合状态和不闭合状态两种磁场组态分别沉积Cr镀层,并利用Langmuir探针诊断其放电等离子体,测量了离子密度、电子密度和电子温度(EED)在两种磁场组态中的分布规律。结果表明:磁场不闭合状态时的等离子体密度较低,而完全闭合状态显著增加了真空腔中部的带电粒子数目。两种不同磁场组态中Cr镀层的沉积速率在靶电流相同的情况下相近。其中不闭合状态的Cr镀层截面为粗大而疏松的柱状结构,表面较粗糙;而完全闭合状态的镀层的柱状生长受到阻碍,表面光滑、平整,致密性好。Ion density,electron density,and electron temperature（EED） of the magnetron sputtering plasma with an unclosed or closed magnetic field were measured during sputtering Cr in an Ar atmosphere.It was showed that the unclosed state plasma exhibited a low density;while closed state plasma exhibited much more charged particles in the center of the vacuum chamber.It was found that the deposition rate of Cr under the closed state was similar to the unclosed state at the same target current.Cr coatings deposited in the unclosed state exhibited large columnar grains and rough surfaces with protuberances.On the other hand,the interruption of the large columnar grain growth accompanied denser microstructure and a smoother surface was observed in the coating obtained in the closed state.

关 键 词：完全闭合状态 不闭合状态 LANGMUIR探针 Cr镀层 离子轰击 

分 类 号：TB34[一般工业技术—材料科学与工程]