CLAM钢表面硬质薄膜的制备与性能研究  

Preparation of hard films on the CLAM steel and their properties

作　　者：储汉奇[1] 李合琴[1] 都智[1] 聂竹华[1] 

机构地区：[1]合肥工业大学材料科学与工程学院,安徽合肥230009

出　　处：《真空》2011年第3期67-71,共5页Vacuum

基　　金：国家"973"项目(2008CB717802);安徽省自然科学基金(090414182);安徽省高校自然科学基金(KJ2009A091)

摘　　要：采用射频反应磁控溅射法在中国低活化马氏体(CLAM)不锈钢表面制备了单层A12O3、SiC、W薄膜以及SiC/A12O3、W/A12O3双层膜。对所制备的薄膜进行了XRD结构分析、AFM表面形貌测试和显微硬度测试。结果表明:单层SiC薄膜表面出现了部分脱落,而SiC/A12O3双层膜表面完整光滑。W/A12O3双层薄膜表面平整光滑,均方根粗糙度为4.28 nm。W单层薄膜和W/A12O3双层薄膜经氩气中800℃退火2 h后硬度最高,分别达到了34.4 GPa和31.3 GPa。A12O3,SiC,W thin films and SiC/A12O3,W/A12O3 bilayer films were prepared by reactive radio-frequency（RF） magnetron sputtering on China low activation martensitic（CLAM） steel.The phase composition,surface morphology and micro hardness of the films were detected by X ray diffractometer（XRD）,atomic force microscopy（AFM） and micro hardness meter.The results showed that,the SiC thin film peeled off to some extent,while the SiC/A12O3 bilayer films are very tight and smooth.The W/A12O3 bilayer films are also very smooth whose root-mean-square roughness is 4.28nm.W thin film and W/A12O3 bilayer films have the highest hardness after annealed for 2h in Ar atmosphere at 800℃,which are 34.4GPa and 31.3GPa respectively.

关 键 词：射频反应磁控溅射 CLAM钢 A12O3薄膜 SIC薄膜 W薄膜 SiC/A12O3双层膜 W/A12O3双层膜 显微硬度 

分 类 号：TB43[一般工业技术]