化学气相沉积金刚石膜的硬度  

Hardness of chemical vaper deposition diamond film

作　　者：唐才先[1] 罗廷礼[1] 张永贵[1] 臧建民[1] 潘存海 石尔平 吕反修[2] 唐伟中 钟国仿 M.Samandi 

机构地区：[1]河北省机电一体化中试基地,石家庄050081 [2]北京科技大学,北京100083 [3]MaterialsEngineeringDepartment

出　　处：《河北省科学院学报》1999年第4期34-36,41,共4页Journal of The Hebei Academy of Sciences

摘　　要：使用力驱动静态超微压痕测量仪器（Ｆｏｒｃｅ Ｄｒｉｖｅｎ Ｓｔａｔｉｃ Ｍｅａｓｕｒｉｎｇ Ｕｌｔｒａ Ｍｉｃｒｏ－ Ｉｎｄｅｎ－ｔａｔｉｏｎ Ｓｙｓｔｅｍ ）－ ＵＭＩＳ－ ２０００ 对由直流等离子体喷射法沉积的金刚石膜进行测量。结果显示金刚石膜的硬度不仅与晶体生长方向和晶粒大小有关，还与厚度有关。生长面和与基底接触面的金刚石膜硬度也有区别。后者被认为由于随机取向的微小晶粒占优势，其硬度比生长面略高。在所进行的测量中，硬度值在９０ＧＰａ左右。Diamond film produced DC arc plasma jet is measured by force driven static measuring ultra micr indentation system UMIS 2000.The result shows that hardness of diamond film is related to not only crystal growth direction but also thickness.The right side of diamond film also differs from the reverse side in hardness.The hardness of the reverse side is harder than the right side,because it have an advantage in small crystal of random direction.Among the measures,the hardness value is 90GPa or so.

关 键 词：CVD 金刚石膜 硬度 超微压痕测量法 

分 类 号：O484.5[理学—固体物理]