磁控溅射制备的W,WSi_2,Si单层膜和W/Si,WSi_2/Si多层膜应力  

Stress analysis of W,WSi_2,Si single layers and W/Si,WSi_2/Si multilayers fabricated by magnetron sputtering

作　　者：黄秋实[1,2] 李浩川[1,2] 朱京涛[1,2] 王晓强[1] 蒋励[1] 王占山[1,2] 唐永建[3] 

机构地区：[1]同济大学物理系,精密光学工程技术研究所,上海200092 [2]上海市特殊人工微结构材料与技术重点实验室,上海200092 [3]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2011年第6期1659-1662,共4页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(10773007,10704056);科技部国际交流与合作专项项目(2008DFA01920)

摘　　要：采用直流磁控溅射技术制备了厚度约100nm的W,WSi2,Si单层膜和周期约为20nm,Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜。利用台阶仪对镀膜前后基底表面的面形进行了测试,计算并比较了不同膜系的应力值。结果表明:W单层膜表现出较大的压应力,而W/Si周期膜则表现为张应力。WSi2单层膜和WSi2/Si周期多层膜均表现为压应力,没有应力突变,应力特性最为稳定。因此,WSi2/Si材料组合是研制大膜对数X射线多层膜较好的材料组合。A series of W,WSi2,Si thin films and W/Si,WSi2/Si periodic multilayers were fabricated by using DC magnetron sputtering technology.Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated.The results indicate that W thin films show relatively large compressive stress,while W/Si multilayers show tensile stress.Both WSi2 thin films and WSi2/Si periodic multilayers show compressive stress.WSi2/Si periodic multilayers have the most stable stress state with no sharp change,and is a good material combination for X-ray multilayer optics with a large number of bilayers.

关 键 词：应力 形变 多层膜 磁控溅射 X射线 

分 类 号：O434.1[机械工程—光学工程]