工艺参数对直流溅射沉积CrAlN涂层结构和性能的影响  

Growth and Characterization of CrAlN Films by DC Magnetron Sputtering

作　　者：郑康培[1] 刘平[2] 李伟[2] 马凤仓[2] 杨丽红[1] 刘新宽[2] 陈小红[2] 

机构地区：[1]上海理工大学机械工程学院,上海200093 [2]上海理工大学材料科学与工程学院,上海200093

出　　处：《真空科学与技术学报》2011年第5期545-549,共5页Chinese Journal of Vacuum Science and Technology

基　　金：上海市科委资助项目(08110511600);上海市教委重点学科项目(J50503)

摘　　要：采用直流反应磁控溅射的方式,用AlCr合金靶,在高速钢(M2)上沉积CrAlN涂层。采用扫描电镜、X射线衍射、能谱和纳米压痕仪等分析和测量手段,系统研究了Ar/N2气流比、气压和基片温度等工艺参数对CrAlN涂层结构和性能的影响。研究表明,Ar/N2气流比、气压和基片温度对涂层均有较大的影响,当Ar/N2气流比为1、总气压为0.2 Pa、基片温度为300℃时所得涂层性能最好,最高硬度和弹性模量分别为34.8,434.3 GPa。The CrAlN coatings were deposited by reactive DC magnetron sputtering on high speed steel substrate（M2）.The impacts of the deposition conditions on the microstructures and mechanical properties were characterized with X-ray diffraction,energy dispersive spectroscopy,scanning electron indentation.The results show that the deposition conditions,including the ratio of the Ar/N2 flow rates,pressure and substrate temperature,strongly affect the microstructures.For instance,at an Ar/N2 ratio of 1,a pressure of 0.2 Pa,and a substrate temperature of 300℃,the fairly compact,smooth CrAlN coatings were deposited with its hardness and elastic modulus of 34.8 GPa and 434.3 GPa,respectively.Possible mechanisms responsible for mechanical property improvement were also discussed.

关 键 词：CrAlN涂层 磁控溅射 Ar/N2气流比 气压 基片温度 

分 类 号：TB43[一般工业技术]