用于SiC超光滑表面加工的大气等离子体抛光系统设计  

Design of the Atmospheric Pressure Plasma Polishing System for Machining of Ultra Smooth Surface

作　　者：王家富[1] 王波[1] 张巨帆[1] 董申[1] 

机构地区：[1]哈尔滨工业大学精密工程研究所,哈尔滨150001

出　　处：《航空精密制造技术》2008年第4期11-14,共4页Aviation Precision Manufacturing Technology

摘　　要：设计了一套基于射频电容耦合放电原理的大气等离子体抛光原型装置,电容耦合等离子体炬首次被应用到了抛光系统中。针对SiC反射镜的加工实验结果表明,系统工作正常,并可以实现亚纳米级的表面粗糙度。A capacity coupled plasma jet is designed and applied in the prototyping atmospheric pressure polishing system. To verify the effectiveness of this novel polishing method, experiments on the generation of atmospheric pressure plasma and the SiC optics polishing are carried out with our prototyping facility. The experiment results show that plasma discharge is stable at the atmospheric pressure and sub-nanometer roughness of the polished SiC surface can be obtained.

关 键 词：常压等离子体 超光滑 抛光 电容耦合 等离子体炬 

分 类 号：TG664[金属学及工艺—金属切削加工及机床]