用于微等离子体无掩膜刻蚀的微悬臂梁探针的设计和加工  

Design and Fabrication of Microcantilever Probes Used for Microplasma Maskless Etching

作　　者：文莉[1] 向伟玮[1] 张秋萍[1] 王海[2] 何利文[1] 褚家如[1] 

机构地区：[1]中国科学技术大学精密机械与精密仪器系,合肥230027 [2]安徽工程大学机械工程系,芜湖241000

出　　处：《纳米技术与精密工程》2011年第3期275-278,共4页Nanotechnology and Precision Engineering

基　　金：国家自然科学基金资助项目(50605061);中央高校基本科研业务费专项资金资助项目

摘　　要：设计了一种用于微等离子体无掩膜刻蚀加工的微悬臂梁探针结构,即将微等离子体放电器集成在SiO2悬臂梁探针端部的空心针尖上,等离子体从针尖处的纳米孔导出,以实现高精度、高效率的无掩膜扫描刻蚀加工.设计了该悬臂梁探针的加工工艺流程,即对(100)硅片进行各向异性湿法刻蚀得到倒金字塔槽,并双面氧化,然后依次沉积并图形化微放电器的上、下电极和绝缘层,最后背面释放出带空心针尖的SiO2悬臂梁,并加工出针尖尖端的纳米孔.成功制作出质量良好、具有很高成品率的带薄壁空心针尖的SiO2悬臂梁探针阵列及倒金字塔型微放电器.实验结果表明,该微放电器能在3～15 kPa的SF6气体中稳定放电,为悬臂梁探针阵列和微放电器的工艺集成以及Si基材料的无掩膜扫描刻蚀加工奠定基础.A microcantilever probe for microplasma maskless etching was proposed and designed,in which a microplasma discharge was integrated into a hollow tip of a SiO2 cantilever probe and the generated microplasmas in the hollow tip were ejected through the nano-scaled aperture to realize maskless etching with high fidelity and high efficiency.The fabrication process of the cantilever was proposed.First,the inverted pyramidal microcavity was formed by anisotropic wet etching on a（100） Si wafer.After thermal wet oxidation on both sides of the wafer,the cathode,dielectric,anode films of the microdischarge were deposited and patterned layer by layer successively.Next,the cantilever was released and nano-aperture on the hollow tip was formed.Finally,a protective metal layer was deposited on the back side of the cantilever.SiO2 cantilever probe arrays with thin-walled hollow tips and inverted pyramidal microdischarges were sucessfully fabricated with good quality and high output.Experimental results show that the devices can discharge stably in SF6 under pressure of 3 kPa to 15 kPa,which lays a good foundation for further integration of cantilever probe arrays and microdischarges and maskless scanning plasma etching of Si.

关 键 词：微等离子体 微悬臂梁 空心针尖 无掩膜刻蚀 

分 类 号：TH703[机械工程—仪器科学与技术]