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作 者:陶永洪[1] 柏松[1] 陈刚[1] 李理[1] 李赟[1] 尹志军[1]
出 处:《固体电子学研究与进展》2011年第6期536-539,共4页Research & Progress of SSE
摘 要:作为测试小管芯,所研制的小栅宽(0.5mm)L波段SiC SIT器件,台面和栅凹槽线宽分别为1.0μm和1.5μm,源间距2.5μm,采用凹栅结构、Al注入形成PN结等优化手段,提高了器件的击穿特性和微波特性。0.5mm栅宽SiC SIT器件,输出功率通过负载牵引系统进行测试,在1.2GHz CW、50V工作电压下测量的输出功率密度达到7.55W/cm,功率增益在7.3dB;在1.4GHz CW、50V工作电压下测量的输出功率率密度达到了4.4W/cm,功率增益在5.76dB。A 0.5 mm gate periphery SiC L-band SIT device with a recessed has been fabricated by using a p-type aluminum implatation to form PN junction on 4 H-SiC wafer, which decreases leakage current and enchances breakdown voltage. The device structure is N-channel with source to source pitch of 2.5μm, source mesa width of 1.0μm and gate trench width of 1.5 μm. Its microwave characteristics have been studied by load-pull system. It exhibited a output power density of 7.55 W/cm with gain of 7.3 dB and 4. 4 W/cm with gain of 5.76 dB under 1.2 GHz and 1.4 GHz CW operation at drain to source voltage of 50 V respectively.
分 类 号:TN304.24[电子电信—物理电子学] TN325.3
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