采用不同功率溅射制备氧化钛薄膜的研究  

Study on titanium oxide films deposited at different sputtering powers

作　　者：王丽格[1] 黄美东[1] 李洪玉[1] 张琳琳[1] 佟莉娜[1] 杜姗[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《天津师范大学学报（自然科学版）》2012年第1期31-34,38,共5页Journal of Tianjin Normal University：Natural Science Edition

基　　金：国家自然科学基金资助项目(61078059);天津师范大学创新计划资助项目(52X09038)

摘　　要：常温下,利用射频(RF)反应磁控溅射方法在K9双面抛光玻璃基底上沉积氧化钛薄膜.采用光栅光谱仪对薄膜样品的透射谱进行测试,通过椭圆偏振光谱仪测试并拟合得到薄膜的厚度、折射率和消光系数等光学参数,借助掠入射角X-射线衍射对薄膜的结晶状态进行了测试.实验结果表明:不同溅射功率下沉积的样品呈非晶态,在40～100W范围内,溅射功率越大,薄膜的沉积速率越大,但溅射功率对折射率和消光系数影响不大.Titanium oxide films were deposited on well-polished K9 glass by reactive radio frequency magnetron sputtering at room temperature. Grating spectrometer was employed to measure the transmittance spectra of the samples. The thickness, refractive index and extinction coefficient of the films were analyzed by spectroscopic ellipsometry. The microstructure of the films was characterized by glancing-angle X-ray diffraction. The results show that the as-deposited films are amorphous. As the sputtering power increases from 40 to 100 W, the deposition rate increases monotonously. However, the sputtering power has little effects on the refractive index or extinction coefficient of the films.

关 键 词：溅射功率 磁控溅射 氧化钛薄膜 光学性能 

分 类 号：TG113.25[金属学及工艺—物理冶金]