MPCVD法纳米金刚石膜的制备及分析  

Preparation and Characterization of Nanocrystalline Diamond Films by MPCVD Method

作　　者：杨武保[1] 吕反修[1] 唐伟忠[1] 佟玉梅[1] 于文秀 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《人工晶体学报》2000年第1期54-58,共5页Journal of Synthetic Crystals

摘　　要：利用MPCVD方法在玻璃基片上成功的制备了非常光滑、致密均匀的纳米金刚石膜。沉积工艺分为两步 :成核 ,CH4 /H2 =3% ;生长 ,O2 /CH4 /H2 =0 .3∶3∶10 0 ;沉积过程中保持工作压力为 4 .0kPa ,衬底温度 50 0℃。拉曼、透射电镜、红外光谱、表面轮廓仪等的测试表明 :膜层由纳米级金刚石晶粒组成 ,最大晶粒尺寸小于 10 0nm ,成核密度大于 10 11/cm2 。成核面晶粒的点阵常数较大 ,表明存在较多缺陷 ,表面粗糙度小于 2nm ,在可见光区完全透明 。Highly uniform,smooth nanocrystalline diamond films have been successfully fabricated with a microwave chemical vapor deposition system.Deposition process are CH 4/H 2=3% in nucleation stage and O 2/CH 4/H 2=0.3∶3∶100 in growth.The chamber pressure was kept at 4.0 kPa,and the substrate temperature was controlled at 500℃.Raman spectroscopy,transmission electron microscopy,surface roughness measurement,and infrared spectroscopy have been used for characterization.Diamond films obtained under these conditions have grain sizes less than 100nm,nucleation density higher than 10 11 /cm 2,and a mean roughness of surface less than 2nm.Good IR property has been shown.

关 键 词：MPCVD 纳米金刚石膜 拉曼光谱 红外光谱 薄膜 

分 类 号：TQ163[化学工程—高温制品工业] O781[理学—晶体学]