灰度掩模技术  

Technique of gray-scale mask

作　　者：李红军[1] 李凤有[1] 于利民 曹颖静 卢振武[1] 廖江红[1] 翁志成[1] 

机构地区：[1]中国科学院长春精密光学机械研究所应用光学国家重点实验室,长春130022

出　　处：《微细加工技术》2000年第1期10-15,共6页Microfabrication Technology

摘　　要：二元光学被誉为“1 990年代的光学技术” ,在国防、科研、生产等领域都显示出广阔的应用前景。衍射光学元件有很多制作方法 ,比较成熟的有二元光学元件加工方法和激光或电子束直写技术加工方法。二元光学元件加工方法存在周期长、成本高且对准较困难的缺点。激光或电子束直写技术所需设备比较昂贵 ,只适合高精度单件生产。介绍了近来发展起来的另一种比较有前途的加工方法一灰度掩模法 ,并展望了其发展前景。Binary optics is called“90's optics technique”·^It shows wider application prospect in national defence,scientific research and production.There are many manufacturing methods for DOE. The BOE manufacture and laser or electron beam writing are much riper methods.The BOE manufacture has disadvantages of long period ,high cost and difficult alignment.Expensive machine is needed in the laser and electron beam writing process.It is suited to manufacture single element with high precision.In this paper,another promising method is presented.That is gray?scale mask method.Also,its prospect is introduced.

关 键 词：二元光学 衍射光学元件 二元光学元件加工 激光直写 灰度掩模 

分 类 号：TN305.7[电子电信—物理电子学] TN405.7