非对称双极脉冲反应磁控溅射制备TiN/NbN多层膜  

TiN/NbN Multilayers Prepared by Asymmetrical Bipolarpulsed Reactive Magnetron Sputtering

作　　者：黑立富[1] 徐俊波[1] 陈良贤[1] 李成明[1] 吕反修[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《材料工程》2012年第7期92-96,共5页Journal of Materials Engineering

基　　金：国家自然科学基金项目(51102013)

摘　　要：采用非对称双极脉冲磁控溅射制备了一系列不同调制周期的TiN/NbN纳米多层膜,利用X射线衍射分析(XRD)、纳米压痕仪、扫描电子显微镜(SEM)表征了薄膜的微观结构、力学性能和断口形貌。结果表明,在调制周期为19.86nm时,纳米压痕硬度达到43GPa。利用三点弯曲法形成裂纹的扩展,并观察到了裂纹的偏转特征。TiN /ZrN multilayers with different modulation periods were prepared by asymmetrical bi- polar pulsed reactive magnetron sputtering. The microstructure, mechanical properties and fracture characteristics of multilayers were investigated by X-ray diffraction, scanning electron microscopy and nonoindentation. The results show that the nanohardness reaches to 43GPa at modulation period 19.86nm. The fracture morphology of TiN/NbN multilayer was observed by SEM after three-point bending test, which reveals that the cracks in the multilayer have a tendency of deflection at the inter- faces and thus a higher cracking resistance of the multilayer can be induced.

关 键 词：纳米多层膜 力学性能 调制周期 

分 类 号：TB34[一般工业技术—材料科学与工程]