高品质金刚石膜微波等离子体CVD技术的发展现状  

Developments in Microwave Plasma Chemical Vapor Deposition Technology for Preparing High Quality Diamond Films

作　　者：唐伟忠[1] 于盛旺[1] 范朋伟[1] 李义锋[1] 苏静杰[1] 刘艳青[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《中国材料进展》2012年第8期33-39,共7页Materials China

基　　金：国家自然科学基金(10675017);国际科技合作项目(2010DFR50130)

摘　　要：金刚石膜拥有许多优异的性能。在制备金刚石膜的各种方法之中,高功率微波等离子体化学气相沉积(MPCVD)法因其产生的等离子体密度高,同时金刚石膜沉积过程的可控性和洁净性好,因而一直是制备高品质金刚石膜的首选方法。在世界范围内,美、英、德、日、法等先进国家均已掌握了以高功率MPCVD法沉积高品质金刚石膜的技术。但在我国国内,高功率MPCVD装备落后一直是困扰我国高品质金刚石膜制备技术发展的主要障碍。首先综述国际上高功率MPCVD装备和高品质金刚石膜制备技术的发展现状,包括各种高功率MPCVD装置的特点。其后,回顾了我国金刚石膜MPCVD技术的发展历史,并介绍北京科技大学近年来在发展高功率MPCVD装备和高品质金刚石膜制备技术方面取得的新进展。Diamond films possess many remarkable properties. Among the various techniques to deposit diamond films,high power microwave plasma chemical vapor deposition （MPCVD） method has the advantages of high density plasma, good controllability and clean environment free from electrode material contamination. Therefore, MPCVD has remains the primary technique useful for depositing high quality diamond films. Western countries have developed abilities to deposit high quality diamond fihns by using high power MPCVD techniques. In contrast, slow development in high power MPCVD apparatus has remained a main obstacle for China to develop its ability to produce high quality diamond films material. In this article, we first review the evolution of high power MPCVD diamond films deposition techniques both abroad and at home. Then, we will present new results of our recent effort to develop high power MPCVD diamond films deposition techniques.

关 键 词：MPCVD金刚石膜沉积技术 高品质金刚石膜 

分 类 号：TB79[一般工业技术—真空技术] TQ164[化学工程—高温制品工业]