利用SOI材料提高触觉传感阵列的性能  

Raising the Performances of Tactile Arrays Using SOI Materials

作　　者：吕世骥[1] 黄庆安[1] 童勤义 袁璟 

机构地区：[1]东南大学微电子中心,南京210018

出　　处：《Journal of Semiconductors》1991年第11期695-699,共5页半导体学报（英文版）

基　　金：国家自然科学基金

摘　　要：利用半导体材料、平面工艺和微机械加工研制触觉传感器是当前触觉传感器研究开发的一个重要方面,其中硅膜片电容式触觉传感阵列则是在研究中被广泛采用的结构.然而,触觉传感阵列的性能常受到微机械加工精度的限制.为了提高电容式触觉传感阵列的性能,本工作以SOI材料中异质结界面作为深槽腐蚀中腐蚀自停止界面,以提高硅膜片的表面平整度和厚度均匀性.在此基础上研制了 16×16硅膜片电容式触觉传感阵列,得到了较好的结果.It is an important respect in devoloping tactile to prepare tactile arrays by semiconductormaterials,planar technology and micromachining technique.The structure of capacitor arraysof silicon film is often adopted, but the performances of this structure always are restrictedby precision of micromachining. In order to improve the uniformity of the thin film of silicon,the interface of hetero-junction of SOI material was used as the interface of etch self-stopping. According to this,the 16×16 capacitor arrays of silicon film were prepared, and good results were obtained.

关 键 词：触觉传感器 SOI材料 微加工 

分 类 号：TP212[自动化与计算机技术—检测技术与自动化装置]