磁控溅射Fe-N单层膜的研究  

Study on Fe-N Films Deposited by DC-Magnetron Sputtering

作　　者：周剑平[1] 李华飚[1] 乔袆 张永平[1] 顾有松[1] 常香荣[1] 赵春生 田中卓[1] 

机构地区：[1]北京科技大学材料物理与化学系,北京100083 [2]北京科技大学国家新金属材料重点实验室,北京100083

出　　处：《金属功能材料》2000年第3期27-31,共5页Metallic Functional Materials

基　　金：国家自然科学基金委员会资助项目

摘　　要：本文研究了在不同温度的基片上进行磁控溅射 ,氮流量对Fe N薄膜的磁性和结构的影响。实验表明 ,基片温度为 2 0 0℃有助于提高Fe N薄膜的软磁性能。基片为室温和 10 0℃ ,氮流量在 0～ 2sccm范围内变化时 ,未发现γ' Fe4 N和α″ Fe16N2 ,薄膜中只有N在α Fe中的固溶体。基片温度 2 0 0℃ ,氮流量大于 1.0sccm时 ,薄膜中出现γ′ Fe4 N ,但仍未发现α″ Fe16N2 ,加氮后薄膜的软磁性能明显小于纯铁。当氮流量是 1.0sccm ,温度 2 0 0℃时 ,矫顽力达到最小值 ,Hc =30 6.6A/m。当氮流量是 0 .5sccm ,温度是 2 0 0℃时 ,饱和磁化强度达到 4πMs =2 .3T。The changes of soft magnetic properties and structure with nitrogen flow rate have been investigated for Fe-N films prepared by magnetron sputtering on glass substrates at different temperatures. Substrate heated at 200℃ during film deposition is effective in improving soft magnetic property. When the nitrogen flow rate is changed from 0 to 2 sccm, only α-Fe nitrogen solid solution is found in Fe-N film deposited at room temperature and 100℃. When the substrate temperature is 200℃ and the nitrogen flow rate is higher than 1 sccm, a mixture of α-Fe and γ′-Fe 4N is formed in Fe-N film. α″-Fe 16 N 2 phase is not found in this study . The soft magnetic property of α-Fe film incorporated of nitrogen is better than that of pure iron. At 200℃, the lowest coercivity(H c=306.6A/m)is obtained at 1.0 sccm nitrogen flow rate, and the highest saturation magnetization(4πM s=2.3T)at 0.5 sccm.

关 键 词：饱和磁化强度 矫顽力 磁控溅射 Fe-N膜 

分 类 号：O484[理学—固体物理]