氮气流量对磁控溅射TiN膜层色泽的影响  

Regulation of the Chromaticity of Sputtered TiN Films by Changing Nitrogen Flow

作　　者：吕长东[1] 黄美东[1] 刘野[1] 许世鹏[1] 薛利[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《电镀与精饰》2013年第3期5-6,12,共3页Plating & Finishing

基　　金：国家自然科学基金(61078059);天津师范大学学术推进计划项目(52X09038)

摘　　要：在国产SA-6T型离子镀膜机上利用反应直流溅射方法,在抛光后的W18Cr4V高速钢基体表面制备TiN膜层,考察氮气流量对薄膜色泽的影响。用扫描电镜对薄膜表面形貌进行观测,发现沉积的TiN膜层质量良好,无孔洞,表面平整、致密。采用色度计定量测试了TiN薄膜的色泽,并分析了氮气流量对色泽的影响。结果表明,氮气流量即沉积气压对装饰镀TiN薄膜的颜色有重要影响,通过调节氮气流量,可有效改变TiN膜层的色泽。TiN薄膜的颜色随氮气流量增大而加深。TiN films were deposited on well-polished W18Cr4V steel using DC magnetron sputtering and effects of nitrogen flow on chromaticity of the TiN films were investigated. SEM was employed to observe the morphology of the films. Results showed that the TiN films fabricated by magnetron sputtering possessed clean and dense surfaces. Chromaticityimeter was used to measure the chromaticity of the films quantitatively, and effects of nitrogen flow on the chromaticity of the films were researched. Results revealed that desired chromaticity could be achieved by adjusting the nitrogen flow and chromaticity of the TiN films became deeper with the increasing of N2 flow.

关 键 词：TIN薄膜 磁控溅射 装饰镀 色泽 氮气 

分 类 号：TG174.444[金属学及工艺—金属表面处理]