ZnO薄膜原子力显微镜图像的多重分形谱  

MULTIFRACTAL SPECTRA OF ATOMIC FORCE MICROSCOPE IMAGES OF ZnO FILM

作　　者：孙霞[1] 熊刚[2] 傅竹西[2] 吴自勤[1] 

机构地区：[1]中国科学技术大学基础物理中心,合肥230036 [2]中国科学技术大学物理系,合肥230036

出　　处：《物理学报》2000年第5期854-862,共9页Acta Physica Sinica

摘　　要：用原子力显微镜测定了Si衬底 ,未退火和退火ZnO薄膜的表面形貌 ,为了获得AFM图像的多重分形谱 ,比较了 5种计算局域高度分布概率的方法 (相对平均高度的方差、相对平均高度的绝对偏离、以粗糙表面最低点为基准面、以一定深度为基准面和以薄膜平均底面为基准面 ) .发现前三种方法在小概率的子集起主要作用时不能很好地满足标度不变性 ,后两种方法则能很好地满足标度不变性 ,其范围可达三个数量级 ,并且可以对不同样品进行定量的比较 .The surface topographies of Si\|substrate and ZnO films as\|deposited and annealed were measured by atomic force microscope (AFM).Five methods (variance from average height,absolute deviation from average height,height based on the minimum height of the rough surface,height based on a depth from the surface,height based on the bottom of the film) for determining height distribution probability are used to calculate the multifractal spectra of AFM images.It is found that the former three methods could not satisfy the scaling law well when the smaller probability subsets provide the main contribution to the partition function.On the other hand,the latter two methods can satisfy the scaling law close to 3 orders of magnitude and can be used to compare roughness between different rough surface quantitatively.

关 键 词：氧化锌薄膜 原子力显微镜图像 多重分形谱 

分 类 号：O484[理学—固体物理]