双光路双波长相移干涉显微法测量衍射光学元件形貌  

Measuring Method for Topography of DOE Based on Dual-Path Two-Wavelength Phase Shifting Interferometric Microscopy

作　　者：周明宝[1] 林大键[1] 白临波[1] 

机构地区：[1]中国科学院光电技术研究所,微细加工光学技术国家重点实验室,成都610209

出　　处：《光学学报》2000年第6期843-846,共4页Acta Optica Sinica

摘　　要：衍射光学元件 (DOE)表面形貌的测量需要解决因表面结构深度较大和表面不连续给测量带来的困难。本文将双波长测量法的思想推广应用到不连续深结构表面的测量 ,并提出了一种新型数据处理方法 ,有效地克服了这些困难。理论分析和测量结果表明 ,基于这些方法的三维表面形貌测量系统纵向分辨率为 0 .5nm,横向分辨率约为 0 .5μm(NA=0 .4 ) ,在整个纵向测量范围内重复测量精度优于 1.3nm,满足了衍射光学元件表面形貌测量的需要。The surfaces of diffraction optical element (DOE) are often deep and discontinuous, which lead to some difficulties for measurement of the 3 D surface topography of DOE. The generalized two wavelength interferometry and a new data processing method are proposed, which effectively overcome the difficulties. Based on these techniques, a new measuring system has been set up with existing conditions. The system′s longitudinal resolution is 0 5 nm, the transversal resolution about 0.5 μm(NA=0 4), the measuring accuracy within the whole longitudinal measuring range is better than 1 3 nm.

关 键 词：衍射光学元件 三维表面形貌 干涉显微镜 

分 类 号：TH74[机械工程—光学工程]