PMMA在石墨烯转移过程中对其表面准周期褶皱的影响  

Influence of PMMA on the Quasi-periodic Nanoripples of Graphene During the Transfer Process

作　　者：郭晓雷[1] 张凯[1] 李伟[1] 梁学磊[1] 申自勇[1] 

机构地区：[1]北京大学电子学系纳米器件物理与化学教育部重点实验室,北京100871

出　　处：《纳米科技》2013年第2期18-22,共5页

基　　金：国家自然科学基金项目（61271050）

摘　　要：利用CVD方法在铜基底上制备了大面积石墨烯，将其转移到PMMA表面，利用AFM和STM对转移前后的石墨烯表面进行了研究，结果表明，利用CVD方法制备的石墨烯表面存在由Cu基底表面台阶引起的大面积准周期性条纹状褶皱；当石墨烯转移到PMMA表面后，褶皱数量显著减少，表面杂质颗粒和裂痕减少，表明PMMA与石墨烯间的相互作用能够提高石墨烯的平整度，改善石墨烯的质量。Graphene on Cu foils was grown by the chemical vapor deposition （CVD） method and transferred to the PMMA photoresist. The graphene on Cu foil and PMMA surface were investigated by AFM and STM, the results indicate that large-area quasi-periodic nanoripples cover the surface of graphene on Cu foil. The graphene transferred to PMMA is clean and crackless, and wrinkles caused by the Cu substrate decrease greatly compared with the graphene on Cu foil. The results show that the interaction between the PMMA and graphene surface can improve the quality of graphene in the transferring process from Cu foil to other substrates.

关 键 词：CVD 石墨烯 转移 PMMA 褶皱 

分 类 号：O485[理学—固体物理]