电弧离子镀不同色泽TiN薄膜的工艺研究  

Fabrication of Colorful TiN Thin Films by Arc Ion Plating

作　　者：刘野[1] 黄美东[1] 路少怀[1] 吴功航[1] 李洪玉[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《电镀与精饰》2013年第5期32-35,共4页Plating & Finishing

基　　金：天津师范大学学术创新推进计划资助(52X09038)

摘　　要：采用电弧离子镀的方法,在硅片上制备TiN仿金装饰膜层,主要研究氮气分压和基体偏压两个工艺参数对TiN薄膜色泽的影响。结果表明,氮气压强对TiN薄膜的色泽有明显的影响和控制作用。随着氮气分压的增大,薄膜的色泽由浅黄色向红棕色变化。实验发现,基体偏压对膜层的色泽也有一定的影响,当氮气分压一定时,施加偏压所得TiN薄膜比不施加的颜色更浅。可见,通过调节基体偏压和氮气流量,可以获得所需颜色的TiN薄膜。TiN films, ideal candidates for decoration, were fabricated on silicon wafer by arc ion plating. Influences of nitrogen partial pressure and substrate bias voltage on color of the films were investigated. Results showed that nitrogen pressure had obvious impact on the films color which would changed from pale yellow to reddish brown with nitrogen partial pressure increasing. The substrate bias voltage also had certain impact on the colour of films. Compared with TiN film deposited without bias voltage ,TiN film fabricated by applying bias volatge had a light color under same nitrogen pressure. So TiN film with prescribed color could be prepared by using appropriate nitrogen partial pressure and certain substrate bias volatge.

关 键 词：多弧离子镀 TIN薄膜 色泽 氮气分压 基体偏压 

分 类 号：TQ153.2[化学工程—电化学工业]